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Precision Supplies for Australia’s Critical Environments
ADVANCED SEMICONDUCTOR MATERIALS
NanoFort Group provides high-purity substrate solutions precision-engineered for the most demanding semiconductor fabrication and advanced research applications. Our comprehensive wafer range is manufactured to the highest global industry standards, ensuring exceptional surface flatness, precise crystalline orientation, and ultra-low metallic contamination levels essential for high-yield device production. From fundamental R&D in quantum computing to high-volume advanced manufacturing, we provide the foundational materials required for next-generation electronic, photonic, and MEMS devices. By sourcing from world-class foundries, we ensure that every substrate meets rigorous specifications for resistivity, TTV (Total Thickness Variation), and surface roughness, empowering Australian researchers and engineers to push the boundaries of micro and nanofabrication.
VARIOUS OPTIONS & CUSTOMIZATION
We collaborate directly with manufacturers to offer extensive customisation across our entire wafer range. Contact our team today to discuss how we can tailor our high-purity substrates to meet your specific project requirements.
PRECISION SUBSTRATE SOLUTIONS
Prime Silicon Wafers (Si)
- Quality Grade: Ultra-flat Prime grade wafers suitable for high-end CMOS, MEMS, and Nanotechnology applications.
- Specifications: Available in P-type (Boron) or N-type (Phosphorus/Antimony) with various orientations (, ).
- Surface Finish: Single-side polished (SSP) or double-side polished (DSP) with < 0.5 nm Ra roughness.
- Standard Diameters: Locally stocked in 2", 3", 4", 6", and 8" formats.
Silicon-on-Insulator Wafers (SOI)
- Structure: A specialized three-layer stack consisting of a Device Layer, Box (Buried Oxide) Layer, and Handle Wafer.
- Applications: Critical for high-speed, low-power integrated circuits, RF devices, and silicon photonics.
- Precision: Manufactured via the SmartCut™ or SIMOX process to ensure uniform layer thickness and superior interface quality.
Silicon Nitride Wafers (Si3N4)
- Coating: High-purity Silicon Nitride film deposited via LPCVD or PECVD on premium silicon substrates.
- Features: Provides excellent electrical insulation, chemical resistance, and an effective diffusion barrier.
- Specialized Use: Ideal for membrane fabrication, KOH etching masks, and thermal isolation in micro-machining.