High-purity silicon wafers available in 4-inch (100mm) and 6-inch (150mm) sizes, suitable for semiconductor, MEMS, and research applications. Options include N-type or P-type doping, with polished surfaces and precise thickness control. Ideal for cleanroom processing, photolithography, and academic labs.
Premium SOI wafers available in 4-inch and 6-inch sizes, ideal for advanced semiconductor, MEMS, and photonics applications. Each wafer features a high-quality silicon device layer, buried oxide (BOX) layer, and handle wafer with tight tolerance control. Suitable for high-performance, low-power device fabrication and cleanroom processing.
High-quality SiC wafers for power electronics, RF devices, and high-temperature semiconductor applications. Available in various sizes and orientations, including 4H and 6H polytypes, with low defect density and excellent thermal stability. Ideal for use in high-voltage, high-frequency, and high-efficiency device manufacturing.
High-performance Si₃N₄ (silicon nitride) wafers designed for use in MEMS, sensors, optical coatings, and semiconductor packaging. Known for their excellent thermal stability, chemical resistance, and mechanical strength, these wafers are ideal for harsh environments and precision microfabrication. Available in multiple diameters with uniform Si₃N₄ film thickness on silicon or other substrates.
Looking for more wafer types?
We also supply:
🔹 Sapphire Wafers
🔸 GaN Wafers
🔹 InP Wafers
🔸 Ge Crystal Wafers
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